| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin capable of constituting a photosensitive resin composition which can easily adjust an alkali dissolution rate to enable good developing properties by an alkali aqueous solution and also can cope with the formation of a fine pattern, and particularly is suitable for photolithography, a photosensitive resin composition containing the resin, and a method for producing the resin. <P>SOLUTION: The resin comprises a constituting unit containing a repeating unit (A) containing an ester group having a leaving group by a proton and a repeating unit (B) having a leaving group by a proton and furthermore, a constituting unit containing a repeating unit (C) in which part of the above ester group in the repeating unit (A) is converted to a carboxy group and a repeating unit (D) in which part of the leaving group by a proton in the repeating unit (B) is converted to a hydrogen atom. <P>COPYRIGHT: (C)2004,JPO |
