摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve such problems that many kinds of substrates used for a photomask have tendency of easily charged, in particular, although quartz glass has extremely excellent optical characteristics, it is much easily charged as electric characteristics, and that when a photomask charged as described above is laid on a photoresist film, exposed and then separated from the photomask, the mask might induce electrostatic discharge and damage a chromium pattern formed on the photomask surface. <P>SOLUTION: The photomask has a light shielding film on the surface of a transparent substrate, the light shielding film formed into a pattern to shield a photoresist film against exposure. In this mask, a conductive transparent resin film is formed over the entire surface of the transparent substrate where the light shielding film is formed. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |