PLASMA REACTOR WITH ELECTRODE ARRANGEMENT FOR PROVIDING A GROUNDING PATH FOR THE PLASMA, AND METHOD OF MANUFACTURING THE SAME,申请号KR20017002685-传众专利搜索

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发明名称	PLASMA REACTOR WITH ELECTRODE ARRANGEMENT FOR PROVIDING A GROUNDING PATH FOR THE PLASMA, AND METHOD OF MANUFACTURING THE SAME
摘要
申请公布号	KR100531164(B1)	申请公布日期	2005.11.28
申请号	KR20017002685	申请日期	2001.02.28
申请人		发明人
分类号	H01L21/3065;(IPC1-7):H01L21/306	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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