Plasma processing apparatus and plasma processing method

摘要

A plasma processing apparatus is provided. According to the apparatus, a main antenna connected to a high frequency power source and an auxiliary antenna electrically insulated from main antenna is arranged. Moreover, projection areas when the main antenna and the auxiliary antenna are seen in a plan view are arranged so as not to overlap with each other. More specifically, the auxiliary antenna is arranged on a downstream side in a rotational direction of the turntable relative to the main antenna. Then, a first electromagnetic field is generated in the auxiliary antenna by way of an induction current flowing through the main antenna, and a second induction plasma is generated even in an area under the auxiliary antenna in addition to an area under the main antenna by resonating the auxiliary antenna.

主权项

1. A plasma processing apparatus configured to perform a plasma process on a substrate, the plasma processing apparatus comprising:
a vacuum chamber; a turntable provided in the vacuum chamber and configured to rotate a substrate loading area to receive the substrate; a process gas supply part to supply a process gas to a substrate; a main antenna provided to face a passing area of the substrate and having a coiled shape configured to excite the process gas and to generate first induction coupled plasma when radio frequency power is supplied thereto; an auxiliary antenna having a coiled shape and kept electrically insulated from the main antenna at a position capable of causing electromagnetic induction with the main antenna, the auxiliary antenna being provided to include a portion that does not overlap with the main antenna when seen in a plan view and configured to excite the process gas and to generate second induction coupled plasma, wherein the auxiliary antenna is not connected to a power source; an impedance adjusting part capable of adjusting an impedance thereof and provided in a loop formed by the auxiliary antenna; and a Faraday shield that holds the main antenna and the auxiliary antenna thereon at a same level relative to the turntable and to allow a magnetic field generated by the main antenna and the auxiliary antenna to pass through the Faraday shield downward from the same level.