发明名称 CARBONYLMETHYLENE HETEROCYCLIC COMPOUND HAVING TRIHALOGENOMETHYL GROUP, MANUFACTURE AND LIGHT SENSITIVE MIXTURE
摘要 Compounds of the formula I <IMAGE> are described in which L denotes H or CO-(R<1>)n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R<1> denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.
申请公布号 JPS6089473(A) 申请公布日期 1985.05.20
申请号 JP19840192770 申请日期 1984.09.17
申请人 HOECHST AG 发明人 RAINHARUTO DENGESU;HANSU RUKERUTO;URURIHI GAISURAA;HARUTOMUUTO SHIYUTETSUPAN
分类号 C07D277/20;C07D209/12;C07D215/10;C07D215/12;C07D215/14;C07D277/12;C07D277/64;C07D277/84;C07D293/00;C07D293/12;C07D521/00;C08F2/00;C08F2/50;C08G85/00;G03C1/00;G03C1/675;G03F7/029 主分类号 C07D277/20
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