MANUFACTURE OF TARGET FOR SPUTTERING DEVICE,申请号JP19850016031-传众专利搜索

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发明名称	MANUFACTURE OF TARGET FOR SPUTTERING DEVICE
摘要
申请公布号	JPS61178474(A)	申请公布日期	1986.08.11
申请号	JP19850016031	申请日期	1985.01.30
申请人	HITACHI METALS LTD	发明人	HIRAO NORIYOSHI;SHIBATA RYOICHI
分类号	C04B35/58;C23C4/06;C23C14/34	主分类号	C04B35/58
代理机构		代理人
主权项
地址

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