| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask blank including at least a transparent substrate, a phase shift film, a light-shielding film, a hard mask film and a resist film successively deposited therein, which has sufficient resist adhesiveness and prevents charging in the hard mask film, and thereby, allows pattern formation with higher resolution and higher accuracy, and a processing method of the photomask blank.SOLUTION: The photomask blank including at least a transparent substrate, a phase shift film, a light-shielding film, a hard mask film and a resist film, successively deposited therein, in which a conductive film comprising a conductive polymer is disposed between the hard mask film and the resist film.SELECTED DRAWING: Figure 1 |
