| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner for reducing the number of manufacturing processes and for reducing the manufacturing cost. SOLUTION: An aligner 30 is constituted of a first aligner 32A and a second aligner 32B for simultaneously exposing patterns, whose exposure conditions are different in parallel with respect to a photosensitive resist film applied to a substrate 1 held by a single-substrate holder 31, and those exposure systems are driven simultaneously and individually. In this case, the first aligner 32A radiates first laser beams with large beam cross-sectional diameters along the peripheral part of the substrate 1 by driving a galvanomirror 35A, and the second aligner 32B radiates second laser beams with small beam cross-sectional diameters with respect to the arbitrary position of the substrate 1 by driving a galvanomirror 35B. Then, a prescribed number pattern for substrate management or the like is plotted.
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