发明名称 |
Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
摘要 |
A discharge electrode improves the uniformity of discharge such as plasma. The electrical discharge electrode, which receives high-frequency power and produces a discharge, comprises an electrode body adapted to receive high-frequency power, and a member for preventing the reflection of high-frequency power from the electrode body. The electrical discharge may comprise plasma generated by an electrical discharge.
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申请公布号 |
US6417079(B1) |
申请公布日期 |
2002.07.09 |
申请号 |
US20010762511 |
申请日期 |
2001.02.08 |
申请人 |
MITSUBISHI HEAVY INDUSTRIES, LTD. |
发明人 |
YAMAKOSHI HIDEO;SATAKE KOJI;DANNO MINORU |
分类号 |
H01L21/205;C23C16/509;H01J37/32;H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):H01L21/20;H01L21/36 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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