| 发明名称 |
Remover for a ruthenium containing metal and use thereof |
| 摘要 |
A method for removing a ruthenium-containing metal includes the step of applying a remover to a semiconductor substrate. The remover includes a cerium (IV) nitrate salt and nitric acid.
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| 申请公布号 |
US6468357(B1) |
申请公布日期 |
2002.10.22 |
| 申请号 |
US20020123197 |
申请日期 |
2002.04.17 |
| 申请人 |
NEC CORPORATION |
发明人 |
AOKI HIDEMITSU;WATANABE KAORI;ISHIKAWA NORIO;MORI KIYOTO |
| 分类号 |
C01G55/00;C23F1/10;C23F1/30;C23G1/02;H01L21/3213;(IPC1-7):C23G1/02 |
主分类号 |
C01G55/00 |
| 代理机构 |
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代理人 |
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