发明名称 Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer
摘要 A semiconductor structure includes a dielectric layer having first and second opposing sides. A conductive layer is adjacent to the first side of the dielectric layer and is coupled to a first terminal, and a conductive barrier layer is adjacent to the second side of the dielectric layer and is coupled to a second terminal. The conductive barrier layer may be formed from tungsten nitride, tungsten silicon nitride, titanium silicon nitride or other barrier materials.
申请公布号 US6479854(B1) 申请公布日期 2002.11.12
申请号 US19990353574 申请日期 1999.07.15
申请人 MICRON TECHNOLOGY, INC. 发明人 THAKUR RANDHIR P. S.;MERCALDI GARRY A.;NUTTALL MICHAEL
分类号 G11C11/404;G11C17/16;H01L21/02;H01L21/285;H01L21/768;H01L21/8242;(IPC1-7):H01L27/108 主分类号 G11C11/404
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