| 摘要 |
PROBLEM TO BE SOLVED: To accurately and appropriately align a photomask with respect to even a large-sized substrate. SOLUTION: The aligning device is provided with photomask holding means 2 and 3, a substrate holding means 7, a detecting means 9, and a force imparting means 3. Alignment marks 5 and 8 are respectively formed on the photomask 1 and the substrate. The positional deviation between the marks 5 and 8 is detected by the detecting means 9, and the force is imparted by the force imparting means 3 to the circumferential edge of the photomask 1 based on the detection result. Then, the photomask 1 is elastically deformed in the plane, and the alignment mark 5 on the mask 1 is moved. Consequently, the positional deviation between the alignment mark 5 on the mask 1 and the alignment mark 8 on the substrate 6 reaches the prescribed value.
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