发明名称 |
SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a TFT having high reliability. SOLUTION: A gate insulation type field effect semiconductor device comprises a channel forming region surrounded by a thin film made of an SiO<SB>x</SB>N<SB>y</SB>to prevent impurities from a glass board or an atmosphere from being diffused. Thus, the high reliability can be obtained even in an acceleration test like a BT test. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003209261(A) |
申请公布日期 |
2003.07.25 |
申请号 |
JP20020343483 |
申请日期 |
2002.11.27 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI;SAKAMA MITSUNORI;MIYANAGA SHOJI;SUMINO SHINYA;NOGUCHI TAKASHI |
分类号 |
H01L21/318;H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L21/318 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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