发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a TFT having high reliability. SOLUTION: A gate insulation type field effect semiconductor device comprises a channel forming region surrounded by a thin film made of an SiO<SB>x</SB>N<SB>y</SB>to prevent impurities from a glass board or an atmosphere from being diffused. Thus, the high reliability can be obtained even in an acceleration test like a BT test. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003209261(A) 申请公布日期 2003.07.25
申请号 JP20020343483 申请日期 2002.11.27
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;SAKAMA MITSUNORI;MIYANAGA SHOJI;SUMINO SHINYA;NOGUCHI TAKASHI
分类号 H01L21/318;H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L21/318
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