| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a thin film deposition method by which an area excepting mask material on a body to be processed where patterning of the mask material is performed is coated with liquid material, patterning is performed by means of the difference of wettability, and when the material is solidified thereafter, the shape of the pattern-formed thin film is made rectangular, and to provide the body to be processed having the thin film. <P>SOLUTION: The method for depositing the thin film in the area of the body to be processed 1 excepting the pattern-formed mask material by performing the patterning of the mask material on the body to be processed 1 includes a mask forming stage S1 to form a part of the shape of the pattern-formed mask material to be vertical shape 2A and form the remaining part of the shape of the pattern-formed mask material to be tapered shape 8, a thin film depositing stage S2 to deposit the thin film by coating the area on the body to be processed 1 with the liquid material 5 and a removing stage ST8 to remove the mask material. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
