发明名称 |
LINE PATTERNING METHOD, DEVICE AND ITS FABRICATING PROCESS, AND ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent short circuit by ejecting functional liquid such that functional liquids temporarily overflowing from a plurality of line patterning areas do not touch each other, and to bring the line patterns closer to each other. <P>SOLUTION: In the line patterning method, functional liquid X is ejected from each ejecting position of lyophilic part H1 displaced in the width direction from the center A in the width direction of each lyophilic part H1 so that the functional liquid X temporarily overflowing from adjacent lyophilic parts H1 do not touch each other thus arranging the functional liquid simultaneously at the plurality of lyophilic parts H1. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2004335852(A) |
申请公布日期 |
2004.11.25 |
申请号 |
JP20030131605 |
申请日期 |
2003.05.09 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRAI TOSHIMITSU |
分类号 |
G02F1/13;G02F1/1368;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;(IPC1-7):H01L21/288;G02F1/136;H01L21/320 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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