发明名称 LINE PATTERNING METHOD, DEVICE AND ITS FABRICATING PROCESS, AND ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To prevent short circuit by ejecting functional liquid such that functional liquids temporarily overflowing from a plurality of line patterning areas do not touch each other, and to bring the line patterns closer to each other. <P>SOLUTION: In the line patterning method, functional liquid X is ejected from each ejecting position of lyophilic part H1 displaced in the width direction from the center A in the width direction of each lyophilic part H1 so that the functional liquid X temporarily overflowing from adjacent lyophilic parts H1 do not touch each other thus arranging the functional liquid simultaneously at the plurality of lyophilic parts H1. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004335852(A) 申请公布日期 2004.11.25
申请号 JP20030131605 申请日期 2003.05.09
申请人 SEIKO EPSON CORP 发明人 HIRAI TOSHIMITSU
分类号 G02F1/13;G02F1/1368;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;(IPC1-7):H01L21/288;G02F1/136;H01L21/320 主分类号 G02F1/13
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