发明名称 |
Thin-film semiconductor device and method of manufacturing the same |
摘要 |
A semiconductor device is manufactured using the method including the steps of anodizing a semiconductor substrate to form a porous semiconductor layer on a semiconductor region of the semiconductor substrate; forming a non-porous semiconductor layer on the porous semiconductor layer; forming a semiconductor element and/or semiconductor integrated circuit in the non-porous semiconductor layer; forming kerfs from a surface side of the non-porous semiconductor layer toward the semiconductor region; and applying a pressure of a fluid to the porous semiconductor layer such that the desired region of the semiconductor element and/or semiconductor integrated circuit is separated from the semiconductor substrate. |
申请公布号 |
US6972215(B2) |
申请公布日期 |
2005.12.06 |
申请号 |
US20030687743 |
申请日期 |
2003.10.20 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SAKAGUCHI KIYOFUMI;YONEHARA TAKAO |
分类号 |
H01L21/265;H01L21/30;H01L21/301;H01L21/304;H01L21/306;H01L21/3063;H01L21/316;H01L21/44;H01L21/46;H01L21/48;H01L21/50;H01L21/78;H01L27/12;H01L29/04;(IPC1-7):H01L21/44 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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