| 摘要 |
PURPOSE:To form efficiently vacuum evaporation pattern of high precision on a substrate which is to be vacuum-evaporated, by use of a mask which is composed of a thin plate and two thick plates sandwiching the thin plate, the thin plate having a pattern perforated therein, and the two thick plates having respectively penetrating holes of specific dimensions. CONSTITUTION:In two thick stainless steel plates 2, 3 are made respectively a penetrating hole 4 of a diameter nearly equal to that of a substrate to be vacuum- evaporated, and a penetrating hole 6 of an effective area smaller than that of the substrate to be vacuum-evaporated and larger than that of the pattern. A thin mask plate 1 made of Mo or phosphor bronze having a required pattern made therein is fitted in a concave part 5 of the thick plate 3, then the thick plate 2 is laid on the plate 3 and the two plate are fixed with screws etc. The substrate to be vacuum- evaporated is inserted into the penetrating hole 4 and is vacuum-evaporated through the penetrating hole 6, hereby a vacuum evaporation pattern of high precision is formed because the mask is very thin. This mask is very useful for the manufacture of liquid crystal parts, semiconductor parts. |
