发明名称 |
Liquid composition used in etching multilayer film containing copper and molybdenum, manufacturing method of substrate using said liquid composition, and substrate manufactured by said manufacturing method |
摘要 |
The present invention provides a liquid composition used for etching a multilayer film containing copper and molybdenum, an etching method for etching a multilayer film containing copper and molybdenum, and a substrate. The present invention further provides a liquid composition for etching a multilayer-film wiring substrate which has an oxide layer (IGZO) including indium, gallium and zinc laminated on the substrate, and further a multilayer film including at least a layer containing molybdenum and a layer containing copper provided thereon, a method for etching a multilayer film containing copper and molybdenum from the substrate, and a substrate. According to the present invention, a liquid composition comprising (A) a maleic acid ion source, (B) a copper ion source, and (C) at least one type of amine compound selected from the group consisting of 1-amino-2-propanol, 2-(methylamino)ethanol, 2-(ethylamino)ethanol, 2-(butylamino)ethanol, 2-(dimethylamino)ethanol, 2-(diethylamino)ethanol, 2-methoxyethylamine, 3-methoxypropylamine, 3-amino-1-propanol, 2-amino-2-methyl-1-propanol, 1-dimethylamino-2-propanol, 2-(2-aminoethoxyl)ethanol, morpholine and 4-(2-hydroxyethyl)morpholine and having a pH value of 4-9 is used. |
申请公布号 |
US9466508(B2) |
申请公布日期 |
2016.10.11 |
申请号 |
US201414763891 |
申请日期 |
2014.04.09 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
Tamai Satoshi;Yube Kunio |
分类号 |
H01L21/4763;C09K13/00;H01L21/3213;C23F1/02;C23F1/18;C23F1/26;C23F1/44;H05K3/06;H01L27/12 |
主分类号 |
H01L21/4763 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A liquid composition, comprising:
(A) a maleic acid ion source; (B) a copper ion source; and (C) an amine compound of at least one type selected from the group consisting of 1-amino-2-propanol, 2-(methylamino)ethanol, 2-(ethylamino)ethanol, 2-(butylamino)ethanol, 2-(dimethylamino)ethanol, 2-(diethylamino)ethanol, 2-methoxyethylamine, 3-methoxypropylamine, 3-amino-1-propanol, 2-amino-2-methyl-1-propanol, 1-dimethylamino-2-propanol, 2-(2-aminoethoxy)ethanol, morpholine and 4-(2-hydroxyethyl)morpholine, wherein a pH value of the liquid composition is from 4-9. |
地址 |
Chiyoda-ku JP |