发明名称 Semiconductor die singulation method
摘要 In one embodiment, semiconductor die are singulated from a semiconductor wafer having a backmetal layer by placing the semiconductor wafer onto a carrier tape with the backmetal layer adjacent the carrier tape, forming singulation lines through the semiconductor wafer to expose the backmetal layer within the singulation lines, and separating portions of the backmetal layer using a fluid.
申请公布号 US9484210(B2) 申请公布日期 2016.11.01
申请号 US201514690972 申请日期 2015.04.20
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC 发明人 Burghout William F.;Conner Dennis Lee;Seddon Michael J.;Yoder Jay A.;Grivna Gordon M.
分类号 H01L21/78;H01L21/304;H01L21/3065;H01L21/02;H01L21/67 主分类号 H01L21/78
代理机构 代理人 Jackson Kevin B.
主权项 1. A method of singulating semiconductor die from a semiconductor wafer comprising: providing a semiconductor wafer having a plurality of semiconductor die formed on the semiconductor wafer and separated from each other by spaces, wherein the semiconductor wafer has first and second opposing major surfaces, and wherein a layer of material is formed along the second major surface, and wherein the layer of material comprises a conductive material; placing the semiconductor wafer onto a first carrier substrate, wherein the layer of material is adjacent the first carrier substrate; singulating the semiconductor wafer through the spaces to form singulation lines, wherein singulating includes stopping in proximity to the layer of material; and separating portions of the layer of material proximate to the singulation lines using a fluid.
地址 Phoenix AZ US