发明名称 Semiconductor structures including liners comprising alucone and related methods
摘要 A semiconductor device including stacked structures. The stacked structures include at least two chalcogenide materials or alternating dielectric materials and conductive materials. A liner including alucone is formed on sidewalls of the stacked structures. Methods of forming the semiconductor device are also disclosed.
申请公布号 US9484196(B2) 申请公布日期 2016.11.01
申请号 US201414189323 申请日期 2014.02.25
申请人 MICRON TECHNOLOGY, INC. 发明人 Song Zhe;Allen Tuman E.;Franklin Cole S.;Gealy Dan
分类号 H01L21/02;H01L45/00;H01L27/115;H01L21/033;H01L27/24 主分类号 H01L21/02
代理机构 TraskBritt 代理人 TraskBritt
主权项 1. A semiconductor structure, comprising: stack structures comprising at least two chalcogenide materials overlying a substrate; and a liner comprising alucone on sidewalls of at least a portion of the stack structures.
地址 Boise ID US