发明名称 |
Semiconductor structures including liners comprising alucone and related methods |
摘要 |
A semiconductor device including stacked structures. The stacked structures include at least two chalcogenide materials or alternating dielectric materials and conductive materials. A liner including alucone is formed on sidewalls of the stacked structures. Methods of forming the semiconductor device are also disclosed. |
申请公布号 |
US9484196(B2) |
申请公布日期 |
2016.11.01 |
申请号 |
US201414189323 |
申请日期 |
2014.02.25 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
Song Zhe;Allen Tuman E.;Franklin Cole S.;Gealy Dan |
分类号 |
H01L21/02;H01L45/00;H01L27/115;H01L21/033;H01L27/24 |
主分类号 |
H01L21/02 |
代理机构 |
TraskBritt |
代理人 |
TraskBritt |
主权项 |
1. A semiconductor structure, comprising:
stack structures comprising at least two chalcogenide materials overlying a substrate; and a liner comprising alucone on sidewalls of at least a portion of the stack structures. |
地址 |
Boise ID US |