发明名称 APPARATUS AND METHOD FOR DELIVERY OF INVOLATILE REAGENTS
摘要 A process and apparatus (100) for delivering an involatile solid source reagent material having a vapor pressure of less than about 0.1 torr at 25 DEG C and 1 atmosphere conditions, and which is thermally unstable at its vaporization temperature, as a source reagent material vapor into a CVD reactor (12) comprising a vaporization zone (22) and a flash vaporization matrix structure (26) for flash vaporizing the involatile solid source reagent material. The invention is particularly useful for delivery of Group II reagents and compounds and complexes of early transition metals such as zirconium and hafnium, and may be usefully employed with Group II beta-diketonate source reagents to form high temperature superconductor material layers as well as for forming interlayers of Group II metal fluorides between superconductor or gallium arsenide overlayers, and for depositing thin films of photonic and ferroelectric materials, e.g., BaTiO3, BaxSr1-xNb2O6, and PbZr1-xTixO3.
申请公布号 WO9312266(A1) 申请公布日期 1993.06.24
申请号 WO1992US10691 申请日期 1992.12.11
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 KIRLIN, PETER, S.;BINDER, ROBIN, L.;GARDINER, ROBIN, A.;VAN BUSKIRK, PETER;ZHANG, JIMING;STAUF, GREGORY
分类号 C23C16/44;C23C16/18;C23C16/40;C23C16/448;C23C16/455;H01L39/24 主分类号 C23C16/44
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