Methods for centrifugally cleaning wafer carriers

摘要

A process for cleaning carriers used to hold semiconductor articles includes loading a carrier on a rotor within a processing chamber. The rotor is rotated while spraying cleaning liquid onto the carrier. A flow of primary drying gas is induced through the processing chamber via the centrifugal action of the rotor. Secondary drying gas is sprayed onto the cariers from nozzles. Carriers are loaded onto carrier supports on the rotor, and are held in place with removable baskets.