发明名称 |
Antireflective coating compositions for photoresist compositions and use thereof |
摘要 |
The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
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申请公布号 |
US5994430(A) |
申请公布日期 |
1999.11.30 |
申请号 |
US19970841750 |
申请日期 |
1997.04.30 |
申请人 |
CLARIANT FINANCE BVI) LIMITED |
发明人 |
DING, SHUJI;LU, PING-HUNG;KHANNA, DINESH N.;SHAN, JIANHUI;DURHAM, DANA L.;DAMMEL, RALPH R.;RAHMAN, M. DALIL |
分类号 |
G03F7/11;C08F8/30;C08F212/14;C08L25/18;C09B69/10;G03F7/09;H01L21/027;(IPC1-7):C08K5/00 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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