发明名称 ELECTROPLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a satisfactory method for plating a metallic film by which a metal oxide formed on the surface of an adhesion film used in an electroplating method is removed without removing the adhesion film, and the defect of burying caused by the generation of voids is not generated at the time of forming a metallic film by an electroplating method and to form metallic wiring high in reliability. SOLUTION: In an electroplating method provided with a stage in which a metallic film 17 is formed on a substrate metal (adhesion film 15) by an electroplating method, a pretreating stage in which only a metal oxide 16 formed on the surface of the substrate metal is removed before executing electroplating is provided. As a pretreating chemical for removing only the metal oxide 16, a soln. contg. oxalic acid or citric acid or contg. both oxalic acid and citric acid is used as the chemical solution contg. hydrochloric acid or a carboxylic group.
申请公布号 JP2000309896(A) 申请公布日期 2000.11.07
申请号 JP19990115686 申请日期 1999.04.23
申请人 SONY CORP 发明人 MAEDA KEIICHI
分类号 H01L21/3205;C23F1/10;C25D3/38;C25D5/34;H01L21/288;H01L21/306;(IPC1-7):C25D5/34;H01L21/320 主分类号 H01L21/3205
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