COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY AND RESIST LAMINATED BODY USING THE SAME

摘要

PURPOSE: To provide a composition for forming an antireflection film for lithography excellent in the balance of compatibility with a general photoresist composition, not producing waste liquid which blocks up waste liquid piping even when coating of a photoresist composition and the formation of an antireflection film are successively carried out with a single coating apparatus, efficiently yielding a semiconductor device and advantageous also to space saving in a clean room and to provide a resist laminated body using the composition. CONSTITUTION: The composition contains a copolymer of vinylimidazole with another water-soluble film forming monomer and a fluorine-containing surfactant. The resist laminated body is obtained by forming an antireflection film comprising a coating solution prepared by dissolving the composition in water on the surface of a photoresist film.