发明名称 SUBSTRATE INSPECTION APPARATUS FOR ENABLING APPEARANCE INSPECTION IN ONE APPARATUS
摘要 PURPOSE: A substrate inspection apparatus is provided to enable appearance inspection by using only one apparatus. CONSTITUTION: A work(71) on a work stage(42) is imaged by an area camera(26) in an appearance inspection part(2) and is processed through image processing, thereby determining quality of a connection part. The work(71) is transferred from the work stage(42) of the appearance inspection part(2) to a work stage(43) of an X-ray inspection part(3) by an alignment camera(39). An X-ray is irradiated from an X-ray source(37). An X-ray image is photographed by a camera(38). The photographed out is subjected to image processing, thereby determining the quality of a part unseen from the appearance of the connection part.
申请公布号 KR20040067908(A) 申请公布日期 2004.07.30
申请号 KR20040002860 申请日期 2004.01.15
申请人 O.N. ELECTRONIC CO., LTD. 发明人 TANAKA HIROFUMI;FUNAIWA KEI
分类号 G01N23/04;G01N21/956;H05K3/34;(IPC1-7):G01N23/04 主分类号 G01N23/04
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