发明名称 INSPECTION APPARATUS, INSPECTION METHOD, AND ARTICLE MANUFACTURING METHOD
摘要 An inspection apparatus which inspects a curved surface of an object is provided. An imaging device images the curved surface with a first region undergone bright field illumination by an illumination device in a first state, and images the curved surface with a second region undergone bright field illumination and with the first region undergone dark field illumination by the illumination device in a second state on a light-receiving condition that the imaging device receives a light amount required to obtain a dark field image of the first region undergone the dark field illumination. A processor performs a process for an inspection of the first region based on a bright field image of the first region undergone the bright field illumination and the dark field image of the first region undergone the dark field illumination.
申请公布号 US2017053394(A1) 申请公布日期 2017.02.23
申请号 US201615229638 申请日期 2016.08.05
申请人 CANON KABUSHIKI KAISHA 发明人 Uemura Takanori
分类号 G06T7/00;G06K9/20;G06T15/50 主分类号 G06T7/00
代理机构 代理人
主权项 1. An inspection apparatus comprising an illumination device, an imaging device, and a processor, and configured to inspect a curved surface of an object including a first region and a second region, wherein the illumination device is configured to be in a first state in which illumination light is emitted from a first position in a first direction and a second state in which illumination light is emitted from a second position in a second direction, the imaging device is configured to image the curved surface with the first region undergone bright field illumination by the illumination device in the first state, and image the curved surface with the second region undergone bright field illumination and with the first region undergone dark field illumination by the illumination device in the second state on a light-receiving condition that the imaging device receives a light amount required to obtain a dark field image of the first region undergone the dark field illumination, and the processor is configured to perform a process for an inspection of the first region based on a bright field image of the first region undergone the bright field illumination and the dark field image of the first region undergone the dark field illumination.
地址 Tokyo JP