发明名称 APPARATUS FOR EXPOSING LINES ON A PHOTOSENSITIVE SURFACE
摘要 Apparatus for exposing lines on a photosensitive surface by means of relative movement between a light beam and the surface in which the quantity of radiant energy impinging upon the surface is controlled by movable, opaque blades that block variable portions of the light beam, with the blade movement being varied in accordance with the relative velocity between the beam and surface. A rectangular aperture is used to define the shape of the beam and the blades are oppositely moved along the direction of travel of the aperture to alter the quantity of light admitted therethrough. Several embodiments of this apparatus are disclosed and include blades having straight ends, variously shaped ends, and a variable iris diaphragm, all of which can controllably limit energy impingement upon the photosensitive surface.
申请公布号 US3836916(A) 申请公布日期 1974.09.17
申请号 US19730336128 申请日期 1973.02.26
申请人 IBM,US 发明人 WILEY J,US
分类号 G03F7/20;(IPC1-7):G03B/ 主分类号 G03F7/20
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