发明名称 Method for fabricating color filter substrate
摘要 The present invention discloses methods and apparatus for fabricating display panels and color filter substrates. The fabricating methods include: providing a glass substrate having a flexible area; forming a etching material layer on a surface of the glass substrate; etching the etching material layer to form black matrices on the glass substrate, wherein the black matrix of the flexible area, which is narrower than the black matrix on the other area, corresponds to a vertical projection of a opaque area between pixels when the flexible area is bending. Hence, the present invention may reduce shadows and improve the transmittance by above methods.
申请公布号 US9488761(B2) 申请公布日期 2016.11.08
申请号 US201414395496 申请日期 2014.09.16
申请人 Shenzhen China Star Optoelectronics Technology Co., Ltd 发明人 Zheng Hua
分类号 G02F1/1335;B29D11/00;G02B5/22;G03F7/00;G03F7/16;G03F7/20;G03F7/36;G02F1/1333 主分类号 G02F1/1335
代理机构 代理人 Cheng Andrew C.
主权项 1. A method for fabricating a color filter substrate, the method comprising: providing a glass substrate which has a flexible area; forming an etching material layer on a surface of the glass substrate; and etching the etching material layer to form black matrices laid in vertical projections on the glass substrate of opaque areas between pixels, wherein the black matrices on the flexible area of the glass substrate are narrower than the black matrices on the other areas of the glass substrate; and wherein the black matrices on the flexible area of the glass substrate still lie in the vertical projections on the glass substrate of the opaque areas between pixels when the flexible area is bending; wherein the etching the etching material layer to form black matrices comprises: exposing the etching material layer by a first photomask to form black matrices with predetermined width laid in the vertical projections on the glass substrate of the opaque areas between pixels; andoverlapping a second photomask on the first photomask and exposing the etching material layer by the first photomask and the second photomask together to narrow the black matrices on the flexible area, wherein the black matrices on the flexible area of the glass substrate are narrower than the black matrices on the other area of the glass substrate.
地址 Shenzhen, Guangdong CN