发明名称 VAPOR DEPOSITION METHOD
摘要 PURPOSE:To form a vapor-deposited film having high crystallinity and orientation properties by rotating and moving a substrate in the flying direction of the vaporizes substance when the vapor-deposited thin film is formed on the surface of the substrate by resistance heating. CONSTITUTION:A sample 8 of an organic or an inorganic material to be vapor- deposited is put in a heating boat 7 in a bell jar 9, and the upper part is covered with a shutter 10. The inside of the bell jar 9 is made vacuum by evacuation, and an electric current is passed through the heating boat 7 to vaporize the sample 8. The shutter 10 is simultaneously opened, and a revolving and moving impeller 4 equipped with a glass substrate 6 is rotated clockwise with a motor 5 to form the vapor-deposited film of the sample 8 on the surface of the substrate 6. In this case, a vapor-deposited film having high crystallinity and orientation properties can be formed even with an organic substance having a low thermal cracking velocity by regulating the revolving and moving velocity of the substrate 8 to a value 1/3-2 times the flying velocity of the vaporized substance.
申请公布号 JPS619569(A) 申请公布日期 1986.01.17
申请号 JP19840129088 申请日期 1984.06.25
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 EBISAWA FUMIHIRO
分类号 C23C14/22;C23C14/24;C23C14/50 主分类号 C23C14/22
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