发明名称 MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a silicon carbide single crystal in which contamination of a heterogeneous polytype is suppressed.SOLUTION: A manufacturing method of a silicon carbide single crystal includes: a step (S01) of filling silicon carbide raw material with a fluidity index of 70 or more and 100 or less into a crucible such that an in-plane composition of sublimation gas generated without causing a partial deviation in a raw material powder when the raw material powder is filled into the crucible by flowing the raw material powder; and a step (S02) of sublimating the silicon carbide raw material by heating the silicon carbide raw material. The method is capable of depositing and growing the silicon carbide single crystal on a seed crystal, in which contamination of a heterogeneous polytype is suppressed.SELECTED DRAWING: Figure 1
申请公布号 JP2016147790(A) 申请公布日期 2016.08.18
申请号 JP20150026537 申请日期 2015.02.13
申请人 SUMITOMO ELECTRIC IND LTD 发明人 SASAKI SUSUMU;HARADA MAKOTO;HORI TSUTOMU
分类号 C30B29/36;C30B23/06 主分类号 C30B29/36
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