发明名称 |
MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a silicon carbide single crystal in which contamination of a heterogeneous polytype is suppressed.SOLUTION: A manufacturing method of a silicon carbide single crystal includes: a step (S01) of filling silicon carbide raw material with a fluidity index of 70 or more and 100 or less into a crucible such that an in-plane composition of sublimation gas generated without causing a partial deviation in a raw material powder when the raw material powder is filled into the crucible by flowing the raw material powder; and a step (S02) of sublimating the silicon carbide raw material by heating the silicon carbide raw material. The method is capable of depositing and growing the silicon carbide single crystal on a seed crystal, in which contamination of a heterogeneous polytype is suppressed.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016147790(A) |
申请公布日期 |
2016.08.18 |
申请号 |
JP20150026537 |
申请日期 |
2015.02.13 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
SASAKI SUSUMU;HARADA MAKOTO;HORI TSUTOMU |
分类号 |
C30B29/36;C30B23/06 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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