| 摘要 |
The present invention relates to a dynamic optical head Layer in an optical lithography system forming patterns on a substrate, the dynamic optical head layer being detachably mounted on the substrate, and the dynamic optical head layer includes a first dielectric layer formed on a top portion thereof, a second dielectric layer formed on a bottom portion thereof, and an dynamic nano aperture layer formed between the first dielectric layer and the second dielectric layer, wherein the dynamic nano aperture layer is made of a material having optical anisotropy, and the first dielectric layer and the second dielectric layer are made of oxide-based materials, nitride-based materials, and carbide-based materials. |
