MOUNTING DEVICE, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

A mounting apparatus is provided to improve the endurance of plasma and eliminate the possibility of metal contamination by forming an electrostatic chuck layer made of a Y2O3 spray layer. A processed object is mounted on a mounting body(21). An electrostatic chuck generates column force between an electrode layer(42) and a processed object by applying a voltage to an electrode buried in an insulation layer and electrostatically absorb the processed object to the surface of the insulation layer, formed on the mounting body. The electrostatic layer as an insulation layer formed on the surface of the electrode layer is made of a Y2O3 spray layer(43) having a thickness of 200-280 mum formed by a plasma spray method. The average surface roughness of the electrostatic layer can be 0.6-0.8 mum. The voltage applied to the electrode layer can be not lower than 2.5 kV.