| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type photoresist composition capable of forming a space pattern excellent in heat resistance and having a high aspect ratio on a thick film board with good perpendicularity and resolution and to provide a board with a photosensitive film, a resist pattern forming method and a method for preparing the photoresist composition. SOLUTION: The positive type photoresist composition contains an alkali- soluble novolak resin in which part of the hydrogen atoms of all hydroxyl groups have been substituted by 1,2-naphthoquinonediazidosulfonyl groups, The novolak resin has an Mw of 4,000-5,000 and an Mw to Mn ratio of <=3.0 and is, e.g. represented by formula (1). |
