发明名称 Compound, photocurable composition, and methods for producing patterned film, optical component, circuit board, electronic component by using the photocurable composition, and cured product
摘要 A compound that increases the photocuring rate of a photocurable composition and reduces the force for releasing a cured product from a mold is provided.;A compound is represented by general formula (1): where Rf represents an alkyl group at least part of which is substituted with fluorine, RO represents an oxyalkylene group or a repeated structure of an oxyalkylene group, N represents a nitrogen atom, RA represents an alkyl group, and RB represents an alkyl group or a hydrogen atom.;
申请公布号 US9593170(B2) 申请公布日期 2017.03.14
申请号 US201414889793 申请日期 2014.05.02
申请人 Canon Kabushiki Kaisha 发明人 Ito Toshiki;Honma Takeshi;Yonezawa Shiori;Sato Hitoshi;Kawasaki Youji
分类号 C08F2/50;C08F2/46;C08G61/04;C07C217/08;G03F7/00;H01L21/02;H01L21/308;H01L21/311;C07C217/40;G02B1/12;H05K3/00;H05K3/30 主分类号 C08F2/50
代理机构 Canon USA, Inc. IP Division 代理人 Canon USA, Inc. IP Division
主权项 1. A photocurable composition comprising: a component (A) which is a polymerizable compound; a component (B) which is a photopolymerization initiator; and a component (C) which is a compound represented by general formula (1):where Rf represents an alkyl group at least part of which is substituted with fluorine, RO represents a repeated structure of an oxyalkylene group or an oxypropylene group, N represents a nitrogen atom, RA represents an alkyl group, and RB represents an alkyl group or a hydrogen atom.
地址 Tokyo JP