| 摘要 |
A decrease in the throughput associated with foreign matter detection is suppressed. The present invention relates to an imprint apparatus (100) configured to form a pattern of an imprint material (114) on a substrate (103) by using a mold (102). The imprint apparatus (100) includes an image capturing unit (119) configured to capture an image of the imprint material (114), and a detection unit (120) configured to detect a foreign matter (503a) present between a placing unit (106) on which the substrate (103) is placed and the substrate (103). The detection unit (120) is configured to detect the foreign matter (503a) on the basis of a first resulting image captured by the image capturing unit (119) before the mold (102) is released from the imprint material (114) into which the mold (102) has been brought into contact and a second resulting image captured by the image capturing unit (119) after the mold (102) is released from the imprint material (114) into which the mold (102) has been brought into contact. |
