| 摘要 |
A photomask(2) for optical alignment and an optical alignment method. By aligning the tail ends of first light-transmission patterns(313) which form a first photomask figure(3), and aligning the front ends of second light-transmission patterns(413) which form a second photomask figure(4) in the photomask(2), the unexposed or underexposed areas do not exist at the tail ends of first substrate units(11) and the front ends of second substrate units(12) during the process of optical alignment, thereby the problem existed in the traditional optical alignment manufacture process, that the brightness of a display is not uniform due to the existing unexposed or underexposed areas, is solved, meanwhile, the reduction of the distance between the first substrate units(11) and the second substrate units(12) on a substrate is facilitated, thereby the utilization rate of the substrate is improved. |
