Method of fabricating a MEMS device

摘要

A microelectromechanical system (MEMS) is comprised of a micromirror device attached to a semiconductor device. A first spacer layer is formed and patterned to form hinge via openings. A hinge metal is deposited above the first spacer layer to form the hinge and the hinge vias. A capping layer is formed above the hinge metal and hinge vias. A second spacer layer is formed above the capping layer and patterned to form a mirror via. The capping layer protects the hinge metal from the developer solution used in the patterning step. The capping layer is removed from within the mirror via opening. Another metal layer is deposited above the second spacer layer to form the mirror and the mirror via.

主权项

1. A method of fabricating a microelectromechanical system (MEMS) device, comprising:
depositing a first photoresist spacer layer above a substrate with circuits formed therein; patterning hinge via openings within the first photoresist spacer layer; depositing a hinge metal layer above the first photoresist spacer layer and within the hinge via openings to form a hinge and hinge vias; depositing a capping layer above the hinge metal layer and above the hinge vias; depositing a second photoresist spacer layer above the capping layer; using a developer solution to pattern a mirror via opening within the second photoresist spacer layer, wherein the capping layer at a bottom of the mirror via opening prevents the developer solution from touching the hinge metal layer; removing the capping layer exposed at the bottom of the mirror via opening to expose the hinge metal layer at the bottom of the mirror via opening; depositing a mirror metal within the mirror via opening and above the second photoresist spacer layer to form a mirror and mirror via, wherein the mirror metal contacts the hinge metal layer at a bottom of the mirror via; removing the first and second photoresist spacer layers and capping layer using an oxygen ash to release the hinge and the mirror.