发明名称 DUAL-GATE CHEMICAL FIELD EFFECT TRANSISTOR SENSOR
摘要 A chemical sensing field effect transistor device is disclosed. The device can include a control gate structure interfacing a control side of a semiconductor channel region, a source region, and a drain region. The control gate structure can comprise a control gate dielectric and a control gate electrode. The device can include a sensing gate structure interfacing the semiconductor channel region, the source region, and the drain region at a sensing side of the semiconductor channel region opposite the control gate structure. The sensing gate structure can comprise a sensing gate dielectric, and a sensing gate electrode. The device can include a functional layer interfacing the sensing gate electrode opposite the sensing gate dielectric. The functional layer can have an exposed interface surface. The functional layer can be capable of binding with a target analyte material sufficient to create a measurable change in conductivity across the semiconductor channel region.
申请公布号 US2017110678(A1) 申请公布日期 2017.04.20
申请号 US201514807527 申请日期 2015.07.23
申请人 University of Utah Research Foundation 发明人 Zang Ling;Bunes Benjamin R.
分类号 H01L51/05;G01N27/414;H01L51/00 主分类号 H01L51/05
代理机构 代理人
主权项 1. A chemical sensing field effect transistor device comprising: a semiconductor channel region interfacing a drain region and a source region; a control gate structure interfacing a control side of the semiconductor channel region, the source region, and the drain region, the control gate structure comprising a control gate dielectric and a control gate electrode; a sensing gate structure interfacing the semiconductor channel region, the source region, and the drain region at a sensing side of the semiconductor channel region opposite the control gate structure, the sensing gate structure comprising a sensing gate dielectric, and a sensing gate electrode; and a functional layer interfacing the sensing gate electrode opposite the sensing gate dielectric, the functional layer having an exposed interface surface, the functional layer capable of binding with a target analyte material sufficient to create a measurable change in conductivity across the semiconductor channel region.
地址 Salt Lake City UT US
您可能感兴趣的专利