Imprint lithography

摘要

An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.

主权项

1. An object provided with an alignment arrangement for use in aligning the object and a further object with respect to each other, wherein the object is an imprint lithography template and the further object is a substrate, or the object is a substrate and the further object is an imprint lithography template, the alignment arrangement comprising:
a first fine alignment mark in the form of a substantially regular grating of a group of adjacent features having spaces therebetween, the periphery of the group of features defining an area within and the substantially regular grating being a diffraction grating; and a second coarse alignment mark located at least partly within the area, the second coarse alignment mark forming an irregularity in the regular grating of the first fine alignment mark and comprising a non-space feature.