VAPOR PHASE DEPOSITION OF ORGANIC FILMS

摘要

Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve.

主权项

1. An apparatus for organic film deposition, comprising:
a vessel configured for vaporizing an organic reactant to form a reactant vapor; a reaction space configured to accommodate a substrate and in selective fluid communication with the vessel; and a control system configured to:
maintain the reactant in the vessel at or above a temperature A;maintain the substrate at a temperature B, the temperature B being lower than the temperature A;transport the reactant vapor from the vessel to the substrate; anddeposit an organic film on the substrate.