MOVABLE BODY DRIVE SYSTEM AND MOVABLE BODY DRIVE METHOD, PATTERN FORMATION APPARATUS AND METHOD, EXPOSURE APPARATUS AND METHOD, DEVICE MANUFACTURING METHOD, AND DECISION-MAKING METHOD

摘要

An exposure apparatus exposes a substrate with illumination light via a projection optical system, and includes a stage disposed below the projection optical system and holds the substrate; an encoder system in which one of a grating section and a head is provided at the stage and the other of the grating section and the head is provided at a frame member disposed above the stage, on a lower end side of the projection optical system, and which irradiates the grating section with a measurement beam via the head and measures positional information of the stage with a plurality of the heads that face the grating section; and a controller coupled to the encoder system, that controls a drive system based on positional information measured with the encoder system while compensating for measurement error of the encoder system related to measurement direction of the positional information by the heads.

主权项

1. An exposure apparatus that exposes a substrate with an illumination light via a projection optical system, the apparatus comprising:
a frame member that supports the projection optical system; a stage that is disposed below the projection optical system and holds the substrate; a drive system that has a motor to drive the stage; an encoder system in which one of a grating section and a head is provided at the stage and the other of the grating section and the head is provided at the frame member to be disposed above the stage, on a lower end side of the projection optical system, and which irradiates the grating section with a measurement beam via the head and measures positional information of the stage with a plurality of the heads that face the grating section; and a controller coupled to the encoder system, that controls the drive system based on the positional information measured with the encoder system while compensating for a measurement error of the encoder system related to a measurement direction of the positional information by the heads, the measurement error occurring due to a relative motion between the heads and the grating section in a different direction that is different from the measurement direction, wherein the controller switches one head of the plurality of heads to another head different from the plurality of heads, during movement of the stage, and after the switching, positional information of the stage is measured with a plurality of heads that include remaining heads and the another head, the remaining heads excluding the one head of the plurality of heads used before the switching.