发明名称 |
THIN FILM TRANSISTORS WITH TRENCH-DEFINED NANOSCALE CHANNEL LENGTHS |
摘要 |
Thin film transistors (TFTs), including radiofrequency TFTs, with submicron-scale channel lengths and methods for making the TFTs are provided. The transistors include a trench cut into the layer of semiconductor that makes up the body of the transistors. Trench separates the source and drain regions and determines the channel length of the transistor. |
申请公布号 |
US2017098715(A1) |
申请公布日期 |
2017.04.06 |
申请号 |
US201514664119 |
申请日期 |
2015.03.20 |
申请人 |
Wisconsin Alumni Research Foundation |
发明人 |
Ma Zhenqiang;Seo Jung-Hun |
分类号 |
H01L29/786;H01L29/66;H01L21/304;H01L29/06 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
1. A field effect transistor comprising:
a layer of single-crystalline inorganic semiconductor comprising an first sublayer in which the semiconductor is n-type doped or p-type doped and a second, oppositely doped sublayer adjacent to the first sublayer; a trench bisecting the first sublayer and extending into the second sublayer to provide a source region in the first sublayer on one side of the trench, a drain region in the first sublayer on the opposite side of the trench, and a channel region in the second sublayer above the trench, wherein the channel region has a length corresponding to the width of the trench; a gate dielectric disposed on the channel region; a gate contact disposed on the gate dielectric; a source contact in electrical communication with the source region; and a drain contact in electrical communication with the drain region. |
地址 |
Madison WI US |