发明名称 PSTTM DEVICE WITH BOTTOM ELECTRODE INTERFACE MATERIAL
摘要 MTJ material stacks, pSTTM devices employing such stacks, and computing platforms employing such pSTTM devices. In some embodiments, perpendicular MTJ material stacks include one or more electrode interface material layers disposed between a an electrode metal, such as TiN, and a seed layer of an antiferromagnetic layer or synthetic antiferromagnetic (SAF) stack. The electrode interface material layers may include either or both of a Ta material layer or CoFeB material layer. In some Ta embodiments, a Ru material layer may be deposited on a TiN electrode surface, followed by the Ta material layer. In some CoFeB embodiments, a CoFeB material layer may be deposited directly on a TiN electrode surface, or a Ta material layer may be deposited on the TiN electrode surface, followed by the CoFeB material layer.
申请公布号 WO2017052635(A1) 申请公布日期 2017.03.30
申请号 WO2015US52430 申请日期 2015.09.25
申请人 INTEL CORPORATION 发明人 OGUZ, Kaan;O'BRIEN, Kevin P.;WIEGAND, Christopher J.;RAHMAN, MD Tofizur;DOYLE, Brian S.;DOCZY, Mark L.;GOLONZKA, Oleg;GHANI, Tahir;BROCKMAN, Justin S.
分类号 H01L43/10;H01L43/02 主分类号 H01L43/10
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