发明名称 |
METHOD OF MANUFACTURING GLASS SUBSTRATE WITH THROUGH HOLE, METHOD OF MANUFACTURING GLASS SUBSTRATE INCLUDING THROUGH ELECTRODE, AND METHOD OF MANUFACTURING INTERPOSER |
摘要 |
Disclosed is a method of manufacturing a glass substrate with a through hole, the glass substrate having a thickness of θf, the method including (1) adjusting a first thickness θ1 of the glass substrate having first and second surfaces facing each other to be a second thickness θ2 (θ2<θ1); (2) forming one or more through holes in the glass substrate by irradiating a laser beam from the first surface of the glass substrate; and (3) wet-etching the glass substrate with the through hole to adjust a size of the through hole to be a predetermined size, so that the thickness of the glass substrate is adjusted from θ2 to the target value of θf. |
申请公布号 |
US2017088457(A1) |
申请公布日期 |
2017.03.30 |
申请号 |
US201615269008 |
申请日期 |
2016.09.19 |
申请人 |
Asahi Glass Company, Limited |
发明人 |
MORI Shigetoshi |
分类号 |
C03C15/00;C03B33/08 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a glass substrate with a through hole, the glass substrate having a thickness of θf, the method comprising:
(1) adjusting a first thickness θ1 of the glass substrate having first and second surfaces facing each other to be a second thickness θ2 (θ2<θ1); (2) forming one or more through holes in the glass substrate by irradiating a laser beam from the first surface of the glass substrate; and (3) wet-etching the glass substrate with the through hole to adjust a size of the through hole to be a predetermined size, so that the thickness of the glass substrate is adjusted from θ2 to the target value of θf. |
地址 |
Chiyoda-ku JP |