发明名称 METHOD OF MANUFACTURING GLASS SUBSTRATE WITH THROUGH HOLE, METHOD OF MANUFACTURING GLASS SUBSTRATE INCLUDING THROUGH ELECTRODE, AND METHOD OF MANUFACTURING INTERPOSER
摘要 Disclosed is a method of manufacturing a glass substrate with a through hole, the glass substrate having a thickness of θf, the method including (1) adjusting a first thickness θ1 of the glass substrate having first and second surfaces facing each other to be a second thickness θ2 (θ2<θ1); (2) forming one or more through holes in the glass substrate by irradiating a laser beam from the first surface of the glass substrate; and (3) wet-etching the glass substrate with the through hole to adjust a size of the through hole to be a predetermined size, so that the thickness of the glass substrate is adjusted from θ2 to the target value of θf.
申请公布号 US2017088457(A1) 申请公布日期 2017.03.30
申请号 US201615269008 申请日期 2016.09.19
申请人 Asahi Glass Company, Limited 发明人 MORI Shigetoshi
分类号 C03C15/00;C03B33/08 主分类号 C03C15/00
代理机构 代理人
主权项 1. A method of manufacturing a glass substrate with a through hole, the glass substrate having a thickness of θf, the method comprising: (1) adjusting a first thickness θ1 of the glass substrate having first and second surfaces facing each other to be a second thickness θ2 (θ2<θ1); (2) forming one or more through holes in the glass substrate by irradiating a laser beam from the first surface of the glass substrate; and (3) wet-etching the glass substrate with the through hole to adjust a size of the through hole to be a predetermined size, so that the thickness of the glass substrate is adjusted from θ2 to the target value of θf.
地址 Chiyoda-ku JP