PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND COATING FILM

摘要

A photosensitive composition for permanent films having a hydroxynaphthalene novolac resin having a structural portion (I) represented by Formula (1) as a repeating unit and containing a hydroxynaphthalene (A) represented by Formula (2) in an amount of 2% by mass or less of the solid content of the resin, and which does not contain a curing agent, or contains a curing agent of 50 parts by mass or less to 100 parts by mass of the resin. In the formulas, R1 represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, or a halogen atom, a plurality of R1 may be the same as or different from each other, R2 represents a hydrogen atom, an alkyl group, or an aryl group, p represents 1 or 2, and q represents 4 or 5, with the proviso that the sum of p and q is 6.;

主权项

1. A photosensitive composition for permanent films, comprising:
a hydroxynaphthalene novolac resin having a structural portion (I) represented by the following General Formula (1) as a repeating unit and containing a hydroxynaphthalene (A) represented by the following General Formula (2) in an amount of 2% by mass or less in terms of the solid content of the resin, provided that the photosensitive composition does not contain a curing agent, or contains a curing agent in an amount of 50 parts by mass or less with respect to 100 parts by mass of the hydroxynaphthalene novolac resin: wherein R1 represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group which may have a substituent, an aralkyl group which may have a substituent, or a halogen atom, a plurality of R1's may be the same as or different from each other, R2 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent, p represents 1 or 2, and q represents 4 or 5, with the proviso that the sum of p and q is 6: wherein R1, p, and q are as defined in General Formula (1).