发明名称 Dual gate TFT substrate structure utilizing COA skill
摘要 The present invention provides a dual gate TFT substrate structure utilizing COA skill, comprising a substrate (1), a bottom gate (2) positioned on the substrate (1), a bottom gate isolation layer (3) covering the bottom gate (2) and the substrate (1), an active layer (4) positioned on the bottom gate isolation layer (3) above the bottom gate (2), an etching stopper layer (5) positioned on the active layer (4) and the bottom gate isolation layer (3), a source/a drain (6) positioned on the etching stopper layer (5) and respectively contacted with two ends of the active layer (4), color filter (8) positioned on the source/the drain (6) and the etching stopper layer (5), and a top gate (9) positioned on the color filter (8) and contacted with the bottom gate (2); the active layer (4) and the thin film of the previous manufacture process can be effectively protected and the original property and the stability of the active layer (4) and the thin film of the previous manufacture process can be ensured.
申请公布号 US9601523(B2) 申请公布日期 2017.03.21
申请号 US201514771202 申请日期 2015.05.21
申请人 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 Zhang Hejing;Tseng Chihyuan;Su Chihyu;Li Wenhui;Shi Longqiang;Lv Xiaowen;Ge Shimin
分类号 H01L27/12;G02F1/1368;H01L21/77;H01L29/786;H01L27/32 主分类号 H01L27/12
代理机构 代理人 Lei Leong C.
主权项 1. A dual gate TFT substrate structure utilizing COA skill, comprising: a substrate, a bottom gate positioned on the substrate, a bottom gate isolation layer covering the bottom gate and the substrate, an active layer positioned on the bottom gate isolation layer above the bottom gate, an etching stopper layer positioned on the active layer and the bottom gate isolation layer, a source/a drain positioned on the etching stopper layer and respectively contacted with two ends of the active layer, a color filter positioned on the source/the drain and the etching stopper layer and a top gate positioned on the color filter and contacted with the bottom gate; wherein the color filter is employed to be a passivation layer and a top gate isolation layer at the same time; and wherein the bottom gate and the top gate are located on opposites sides of the active layer and corresponding to the active layer, the bottom gate and the top gate being electrically connected to have a common electrical potential to be both acting on the active layer.
地址 Shenzhen, Guangdong CN