发明名称 PROCESO Y DISPOSITIVO ELECTROLITICOS DE INYECCION EN PARALELO
摘要 The invention discloses a parallel jet electrolytic process, wherein an electrolyte after being pressurized is jetted in parallel from a position at the bottom and near a surface of a cathode at a rate of 0.5-2.5 m/s into a gap between the cathode and an anode. During the production process, the pressurized electrolyte is jetted in parallel along the surface of the cathode, and the electrolyte flows from bottom to top at the cathode side and moves from top to bottom at the anode side simultaneously, which thus achieves a side cutting function on the cathode and the anode; and the side cutting flow of the electrolyte from top to bottom at the anode is able to greatly increase the settling rate of the anode slime and avoid its adhesion to the anode to form an anode slime layer. The invention also provides a parallel jet electrolytic device.
申请公布号 ES2606021(A1) 申请公布日期 2017.03.17
申请号 ES20160030229 申请日期 2016.02.26
申请人 Yanggu Xiangguang Copper CO., LTD 发明人 ZHOU, Songlin;NING, Wantao;GAO, Junjiang
分类号 C25C1/12;C25C7/00 主分类号 C25C1/12
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