发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 A non-volatile memory device comprises a first electrode, a second electrode stacked on the first electrode, a semiconductor layer extending in a first direction through the first electrode and the second electrode, charge storage parts respectively provided between the first electrode and the semiconductor layer and between the second electrode and the semiconductor layer, and a barrier body arranged with the first electrode and the second electrode in a second direction orthogonal to the first direction and extending in the first direction. A distance between the second electrode and the barrier body is wider in the second direction than a distance between the first electrode and the barrier body.
申请公布号 US2017077132(A1) 申请公布日期 2017.03.16
申请号 US201615063923 申请日期 2016.03.08
申请人 Kabushiki Kaisha Toshiba 发明人 INOKUMA Hideki
分类号 H01L27/115 主分类号 H01L27/115
代理机构 代理人
主权项 1. A non-volatile memory device comprising: a first electrode; a second electrode stacked on the first electrode; a semiconductor layer extending in a first direction through the first electrode and the second electrode; charge storage parts respectively provided between the first electrode and the semiconductor layer and between the second electrode and the semiconductor layer; and a barrier body arranged with the first electrode and the second electrode in a second direction orthogonal to the first direction and extending in the first direction, a distance between the second electrode and the barrier body being wider in the second direction than a distance between the first electrode and the barrier body.
地址 Minato-ku JP