发明名称 半導体装置とその製造方法
摘要 PROBLEM TO BE SOLVED: To realize stable performance of normally-off operation in a semiconductor device comprising a group III-V compound semiconductor while having hetero-structure.SOLUTION: A semiconductor device is laminated by a p-GaN layer 32, an SI-GaN layer 62, and an AlGaN layer 34, and also comprises a gate electrode 44 Schottky-connected to a top surface side of the AlGaN layer 34. A band gap of the AlGaN layer 34 is larger than that of the p-GaN layer 32, and the SI-GaN layer 62 has impurity concentration of 1×10cmor less.
申请公布号 JP6096523(B2) 申请公布日期 2017.03.15
申请号 JP20130018260 申请日期 2013.02.01
申请人 トヨタ自動車株式会社;株式会社豊田中央研究所 发明人 杉本 雅裕;加地 徹;中野 由崇;上杉 勉;上田 博之;副島 成雅
分类号 H01L21/338;H01L21/336;H01L21/337;H01L27/098;H01L29/778;H01L29/78;H01L29/786;H01L29/808;H01L29/812 主分类号 H01L21/338
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